Semiconductor device and method of fabricating the same

ABSTRACT

Since at least a portion of a trench capacitor electrode is formed by a metal, the electrical sheet resistance of the electrode can be lowered, and the signal propagation time prolonged by CR delay can be shortened. This can reduce the read/write time. The formation of a buried gate electrode can realize a reduction of the cell area, which is required in a DRAM- and a DRAM/logic-embedded device. This can increase the gate length and reduce the short channel effect. Since an insulating protective film is deposited on the gate electrode, a bit line contact can be formed in self-alignment.

CROSS REFERENCE TO RELATED APPLICATION

[0001] This application claims benefit of priority under 35 USC 119 toJapanese Patent Application No. 2001-85882, filed on Mar. 23, 2001, theentire contents of which are incorporated by reference herein.

BACKGROUND OF THE INVENTION

[0002] The present invention relates to a semiconductor device and amethod of fabricating the same and, more particularly, to asemiconductor device and a method of fabricating the same, by whichhigh-speed operations and high integration can be realized in a DRAM(Dynamic Random Access Memory) or in an embedded device having both aDRAM and a logic circuit.

[0003] A trench capacitor and a stacked capacitor are currently mostpopular as a storage node of a DRAM. In particular, a trench capacitoris often used as a capacitor suited to an embedded device for thefollowing reasons. That is, since the capacitor can be formed before theformation of a logic circuit, the logic process is less influenced. Inaddition, the capacitor is buried in a silicon substrate, so no suchdeep contact formation as for a stacked capacitor is necessary in aninterconnection step.

[0004] The structure of a trench capacitor relevant to the presentinvention will be described below with reference to its fabricationmethod.

[0005]FIGS. 19A to 20C are sectional views showing the steps of themethod of fabricating the trench capacitor related to the presentinvention.

[0006] First, as shown in FIG. 19A, a 5-nm thick silicon oxide film 102and a 150-nm thick silicon nitride film 103 are deposited on a siliconsubstrate 101. A photoresist 104 is removed by photolithography from aregion where a trench is to be formed. The silicon oxide film 102 andthe silicon nitride film 103 are etched away by RIE (Reactive IonEtching).

[0007] As shown in FIG. 19B, RIE is again used to etch the siliconsubstrate 101, forming a trench 105 about 5 μm deep from the siliconsurface. After that, the photoresist 104 is removed.

[0008] As shown in FIG. 19C, a silicon nitride film 106 about 5 nm thickis formed on the inner walls of the trench 105. Additionally, firstpolysilicon 107 doped with an n-type impurity such as arsenic (As) isdeposited to have a thickness of about 500 nm, thereby completelyfilling the trench 105.

[0009] As shown in FIG. 19D, an etch back process using CMP (ChemicalMechanical Polishing) and RIE is performed to etch the surface of thepolysilicon 107 to a depth of about 0.5 μm from the surface of thesilicon substrate 101. Furthermore, the silicon nitride film 106 exposedto the inner walls of the trench is etched away, and a collar siliconoxide film 108 about 100 nm thick is deposited.

[0010] As shown in FIG. 20A, second polysilicon 109 is buried. Morespecifically, the collar silicon oxide film 108 on the substrate 101 isetched by RIE so as to remain only on the side walls of the trench. Inaddition, second polysilicon 109 doped with an n-type impurity such asarsenic is deposited by about 300 nm, thereby completely filling thetrench 105.

[0011] Next, as shown in FIG. 20B, third polysilicon 110 is buried. Morespecifically, an etch back process using CMP and RIE is performed toetch the polysilicon 109 to a depth of 0.25 μm from the silicon surface.The exposed collar silicon oxide film 108 is etched away, and thirdpolysilicon 110 doped with an n-type impurity such as arsenic isdeposited by about 200 nm, thereby completely filling the trench 105.

[0012] Finally, as shown in FIG. 20C, an etch back process using CMP andRIE is performed to etch the polysilicon 110 to a depth of 0.05 μm fromthe surface of the silicon substrate 101. After that, the upper surfaceof the trench 105 is covered with a silicon oxide film 111, and thesilicon nitride film 103 is removed to complete a trench capacitorburied in the silicon substrate.

[0013] As an electrical connection terminal to this trench capacitor, ann-type diffusion layer 112 formed by an n-type impurity such as arsenicoozing out from the third polysilicon 110 is used.

[0014] Unfortunately, this trench capacitor relevant to the presentinvention has the problem that read and write operations are difficultto perform at high speed. That is, This trench capacitor is formed byfilling the 5-μm deep trench with the polysilicon portions 107, 109, and110. Although each of these polysilicon portions is doped with an n-typeimpurity such as arsenic, the electrical sheet resistance is very high,about a few kΩ. This prolongs the time of signal propagation by CRdelay, so the read/write time cannot be shortened.

[0015] Meanwhile, with the advance of information communicationtechnologies, demands for high-speed, large-capacity DRAMs are more andmore increasing. The latest 256-M versatile DRAM and a DRAM-embeddedlogic device formed by the 0.18-μm rule use the above-mentioned trenchcapacitor structure. However, the operating speed is limited for theabove reason.

[0016] Also, these devices must be improved in many respects from theviewpoint of integration density. That is, these devices relevant to thepresent invention use a “folded bit line system” in order to reduce thecell area. To further advance micropatterning and high integration, itis necessary to, e.g., {circle over (1)} shorten the gate length of acell transistor, {circle over (2)} use a self-aligned contact structureas a bit line contact, and {circle over (3)} use a newly designed cell.

[0017] Furthermore, in present DRAM/logic embedded devices, salicide isadhered to the gate in order to improve the data transfer rate of theDRAM. To further improve this data transfer rate, it is necessary todevelop a novel capacitor structure having a lower resistance and toalso develop a gate electrode structure matching well with this novelcapacitor structure.

SUMMARY OF THE INVENTION

[0018] According to an aspect of the present invention, there isprovided a semiconductor device having a trench capacitor, wherein thetrench capacitor comprises a trench formed in a semiconductor substrate,an insulating layer formed on the inner wall surfaces of the trench, andan electrode portion formed inside the trench having the insulatinglayer, and the electrode portion has a metal portion.

[0019] According to another aspect of the present invention, there isprovided a semiconductor device wherein four memory capacitors arearranged into a substantially cross shape around a bit line contact, andeach of the four memory capacitors can be connected to the bit linecontact.

[0020] According to still another aspect of the present invention, thereis provided a semiconductor device comprising a bit line contact, fourmemory capacitors formed around the bit line contact, and four gateelectrodes formed between the four memory capacitors and the bit linecontact.

[0021] According to still another aspect of the present invention, thereis provided a semiconductor device comprising a bit line contact, aplurality of gate electrodes formed around the bit line contact, and aplurality of memory capacitors formed around the bit line contact,wherein each of the plurality of memory capacitors and the bit linecontact can be connected or disconnected by changing a voltage to beapplied to a corresponding one of the plurality of gate electrodes, andat least one of the plurality of gate electrodes is formed on apredetermined surface, and the other of the plurality of gate electrodesis formed below the predetermined surface.

[0022] According to an aspect of the present invention, there isprovided a method of fabricating a semiconductor device in which aplurality of trench capacitors are formed around a bit line contact, andeach of the plurality of trench capacitors can be connected to ordisconnected from the bit line contact, comprising the steps of formingthe plurality of trench capacitors on a semiconductor substrate, formingsome of a plurality of gate electrodes each for performing switching fora corresponding one of the plurality of trench capacitors, such that thesome gate electrodes are buried in the surface of the substrate, formingthe remaining ones of the plurality of gate electrodes on the surface ofthe substrate so as to be substantially perpendicular to the some gateelectrodes, covering the side surfaces of the remaining gate electrodeswith an insulating layer, and forming the bit line contact in contactwith the insulating layer.

BRIEF DESCRIPTION OF THE DRAWINGS

[0023]FIG. 1 is a conceptual view showing the main sectional structureof a capacitor formed in a semiconductor device according to the firstembodiment of the present invention;

[0024]FIGS. 2A to 2D are sectional views showing the steps of a methodof fabricating the capacitor of the first embodiment;

[0025]FIGS. 3A to 3C are sectional views showing the steps of the methodof fabricating the capacitor of the first embodiment;

[0026]FIG. 4 is a conceptual view showing the sectional structure of acapacitor as a modification of the first embodiment;

[0027]FIGS. 5A to 5C are sectional views showing the major steps of amethod of fabricating the capacitor of the modification;

[0028]FIG. 6 is a conceptual view showing the main sectional structureof a capacitor formed in a semiconductor device according to the secondembodiment of the present invention;

[0029]FIGS. 7A to 7D are sectional views showing the steps of a methodof fabricating the capacitor of the second embodiment;

[0030]FIGS. 8A to 8C are sectional views showing the steps of the methodof fabricating the capacitor of the second embodiment;

[0031]FIG. 9 is a conceptual layout view showing the planar arrangementof memory cells of a semiconductor device according to the thirdembodiment of the present invention;

[0032]FIG. 10A is a sectional view taken along a line A-A in FIG. 9,FIG. 10B is a sectional view taken along a line B-B in FIG. 9, FIG. 10Cis a sectional view showing the main parts of a logic circuit portionshown in FIG. 10A, and FIG. 10D is a sectional view showing the majorcomponents of a logic circuit portion shown in FIG. 10B;

[0033]FIG. 11 is a plan layout view showing an example of the cellstructure of a DRAM;

[0034]FIGS. 12A and 12B are sectional views showing the steps of amethod of fabricating a memory cell and logic circuit portion accordingto the third embodiment of the present invention;

[0035]FIGS. 13A and 13B are sectional views showing the steps of themethod of fabricating the memory cell and logic circuit portion of thethird embodiment;

[0036]FIGS. 14A and 14B are sectional views showing the steps of themethod of fabricating the memory cell and logic circuit portion of thethird embodiment;

[0037]FIGS. 15A and 15B are sectional views showing the steps of themethod of fabricating the memory cell and logic circuit portion of thethird embodiment;

[0038]FIGS. 16A and 16B are sectional views showing the steps of themethod of fabricating the memory cell and logic circuit portion of thethird embodiment;

[0039]FIGS. 17A and 17B are sectional views showing the steps of themethod of fabricating the memory cell and logic circuit portion of thethird embodiment;

[0040]FIGS. 18A and 18B are sectional views showing the steps of themethod of fabricating the memory cell and logic circuit portion of thethird embodiment;

[0041]FIGS. 19A to 19D are sectional views showing the steps of a methodof fabricating a trench capacitor relevant to the present invention; and

[0042]FIGS. 20A to 20C are sectional views showing the steps of themethod of fabricating the trench capacitor relevant to the presentinvention.

DESCRIPTION OF THE PREFERRED EMBODIMENTS

[0043] Embodiments of the present invention will be described below withreference to the accompanying drawings.

[0044] (First Embodiment)

[0045] As the first embodiment of the present invention, a semiconductordevice having a capacitor capable of high-speed operation will beexplained.

[0046]FIG. 1 is a conceptual view showing the major sectional structureof the capacitor formed in the semiconductor device of this embodiment.

[0047] That is, this capacitor is a trench capacitor formed in a siliconsubstrate 1; the capacitor is divided into three regions A, B, and C inthe longitudinal direction of the trench. In the region A at the bottomportion of the trench, a nitride film 6, polysilicon 7, a barrier layer8, and a metal electrode 9 are formed in this order from the trenchinner walls. In the region B in the middle of the trench, a collarsilicon oxide film 10, polysilicon 11, a barrier layer 12, and a metalelectrode 13 are formed in this order from the trench inner walls. Inthe region C at the entrance of the trench, polysilicon 14, a barrierlayer 15, and a metal electrode 16 are formed in the order named fromthe trench inner walls.

[0048] In addition, a diffusion region 18 is formed in the siliconsubstrate 11 in a portion around the region C.

[0049] In this embodiment as described above, the main portions of theelectrodes buried in the trench are formed by the metal electrodes 9,13, and 16. The sheet resistance of these metals is only a few Ω, whichis much lower than the sheet resistance (about a few kΩ) of polysilicon.Accordingly, the CR constant can be greatly lowered compared to that ofa capacitor using polysilicon electrodes. As a consequence, it ispossible to greatly improve the transfer rate of the capacitor andthereby remarkably raise the operating speed of a DRAM or a DRAM/logicembedded device.

[0050] More specifically, the upper limit of the system clock frequencyof a semiconductor device using a capacitor having polysiliconelectrodes is about 200 MHz. In contrast, when the capacitor of thisembodiment is used, the clock frequency upper limit can be increasedtenfold or more.

[0051] Also, since at least a portion of the electrode of the trenchcapacitor is formed by polysilicon and metal, advantages common to thestructure using a polysilicon electrode can be obtained. Thisfacilitates ensuring the reliability of the fabrication process andelement.

[0052] In addition, since portions (the titanium nitride layers 8, 12,and 15) made of a metal nitride are formed between the metal and thepolysilicon, it is possible to obtain the function of a barrier layerand the effect of preventing peeling.

[0053] Furthermore, the metal portion of the electrode of the trenchcapacitor is divided into a plurality of regions along the direction ofdepth of the trench. This makes it possible to divisionally form thestorage node at the bottom portion of the trench and the collar siliconfilm near the bottom of the trench.

[0054] The resistance of the electrode can be further lowered bycontinuously forming this metal portion along the direction of depth ofthe trench.

[0055] Examples of the material of the metal electrodes 9, 13, and 16used in this embodiment are tungsten (W), tantalum (Ta), nickel (Ni),molybdenum (Mo), titanium (Ti), aluminum (Al), and copper (Cu), theprocess of each of which is established in silicon devices. Of thesemetals, when a refractory metal such as tungsten or molybdenum is used,deterioration of the semiconductor can be suppressed even when it isnecessary to expose the device to high temperatures during thefabrication process. This can maintain the reliability at high level.

[0056] On the other hand, when a high-conductivity metal such asaluminum or copper is used, it is possible to increase the transfer rateof the capacitor and perform high-speed operations.

[0057] Referring to FIG. 1, the metal electrodes used in the regions A,B, and C need not be made from the same material. That is, these metalelectrodes 9, 13, and 16 can also be formed by different materials.

[0058] In the structure shown in FIG. 1, the polysilicon portions 11 and14 and the barrier layers 12 and 15 interpose in the boundaries betweenthe regions A, B, and C. However, the present invention is not limitedto this embodiment. This portion will be described in detail later bytaking a modification as an example.

[0059] A method of fabricating the trench capacitor shown in FIG. 1 willbe described below.

[0060]FIGS. 2A to 3C are sectional views showing the steps of a methodof fabricating the capacitor of the fist embodiment.

[0061] First, as shown in FIG. 2A, a 5-μnm thick silicon oxide film 2and a 150-μnm thick silicon nitride film 3 are deposited on a siliconsubstrate 1. A photoresist 4 is removed by photolithography from aregion where a trench is to be formed. The silicon oxide film 2 and thesilicon nitride film 3 are etched away by RIE.

[0062] As shown in FIG. 2B, RIE is again used to etch the siliconsubstrate 1, forming a trench 5 about 5 μm deep from the surface of thesubstrate 1, and the photoresist 4 is removed.

[0063] As shown in FIG. 2C, the trench is filled. More specifically, asilicon nitride film 6 about 5 nm thick is formed on the inner walls ofthe trench 5. First polysilicon 7 doped with an n-type impurity such asarsenic (As) is deposited by 50 nm, thereby covering the inner walls ofthe trench 5 with this polysilicon 7. Additionally, titanium nitride 8and tungsten (W) 9 are deposited to have thicknesses of about 10 nm andabout 450 nm, respectively, thereby completely filling the trench 5.This titanium nitride 8 functions as a barrier layer for preventingdiffusion of the tungsten 9 into the semiconductor substrate 1, and alsofunctions as a glue layer for improving adhesion between the polysilicon7 and the tungsten 9.

[0064] As shown in FIG. 2D, the trench is etched. More specifically, anetch back process using CMP and RIE is performed to etch the polysilicon7, the titanium nitride 8, and the tungsten 9 to a depth of about 0.5 μmfrom the surface of the substrate 1. After that, the silicon nitridefilm 6 exposed to the inner walls of the trench is etched away, and acollar silicon oxide film 10 about 100 nm thick is deposited.

[0065] As shown in FIG. 3A, the trench is filled again. Morespecifically, the collar silicon oxide film 10 is etched by RIE so as toremain only on the side walls of the trench. After that, secondpolysilicon 11 doped with an n-type impurity such as arsenic isdeposited by about 50 nm to cover the inner walls of the trench 5 withthis polysilicon 11. Subsequently, titanium nitride 12 and tungsten 13are deposited by about 10 nm and about 250 nm, respectively, therebycompletely filling the trench 5. This titanium nitride 12 also functionsas both a barrier layer and a glue layer.

[0066] Next, as shown in FIG. 3B, a buried structure near the opening ofthe trench is formed. More specifically, an etch back process using CMPand RIE is performed to etch the polysilicon 11, the titanium nitride12, and the tungsten 13 to a depth of about 0.25 μm from the surface ofthe substrate 1. After that, the collar silicon oxide film 10 exposed tothe trench inner walls is etched away, and third polysilicon 14 dopedwith an n-type impurity such as arsenic is deposited by about 50 nm tocover the inner walls of the trench 5 with this polysilicon 14.Subsequently, titanium nitride 15 and tungsten 16 are deposited by about10 nm and 150 nm, respectively, thereby completely filling the trench 5.This titanium nitride 15 also functions as both a barrier layer and aglue layer.

[0067] Finally, as shown in FIG. 3C, the trench is covered. Morespecifically, an etch back process using CMP and RIE is performed toetch the polysilicon 14, the titanium nitride 15, and the tungsten 16 toa depth of about 0.05 μm from the surface of the substrate 1. Afterthat, the upper surface of the trench 5 is covered with a silicon oxidefilm 17, and the silicon nitride film 3 is removed. Consequently, asshown in FIG. 3C and FIG. 1, a trench capacitor buried in the siliconsubstrate is completed.

[0068] As an electrical connection terminal to this trench capacitor, adiffusion region 18 formed by an n-type impurity such as arsenic oozingout from the third polysilicon 14 can be used.

[0069] The trench capacitor shown in FIG. 1 can be fabricated asdescribed above.

[0070] Next, a modification of this embodiment will be explained.

[0071]FIG. 4 is a conceptual view showing the sectional structure of acapacitor as a modification of this embodiment.

[0072] That is, in the capacitor shown in FIG. 4, metal electrodes 9,13, and 16 are continuously formed with only barrier metals 12 and 15between them, without forming polysilicon portions 11 and 14. In thisstructure, electric charge can be transferred from the metal electrode 9in a bottom region A with no intervention of polysilicon. This canfurther increase the operating speed.

[0073] A method of fabricating the capacitor of this modification willbe explained below.

[0074]FIGS. 5A to 5C are sectional views showing the major steps of themethod of fabricating the capacitor of this modification. That is, FIGS.5A to 5C illustrate some of the steps of forming a region B on analready formed region A, corresponding to the steps shown in FIGS. 2Dand 3A.

[0075] In this modification, as in the above embodiment, a collarsilicon oxide film 10 is formed on the inner walls of a trench as shownin FIG. 5A.

[0076] Next, as shown in FIG. 5B, this collar silicon oxide film 10 onthe bottom of the trench is etched by RIE so as to remain only on theside walls of the trench. After that, second polysilicon 11 is depositedto cover the inner walls of the trench.

[0077] As shown in FIG. 5C, the polysilicon 11 is etched back. Morespecifically, an etching method having strong anisotropy such as RIE isused to perform etching in a direction indicated by the arrows in FIG.5B. Consequently, those portions of the polysilicon 11 which exist onthe bottom of the trench and on a substrate 1 are preferentially etched,and the portion covering the trench side walls remains.

[0078] When a tungsten electrode 9 is thus exposed to the bottom of thetrench, a barrier layer 12 and a metal electrode 13 are deposited inthis order as described previously with reference to FIG. 3A.

[0079] Although not shown, a region C is similarly formed. That is,polysilicon 14 is etched back by anisotropic etching to remove only aportion of this polysilicon 14 on the bottom of the trench and exposethe metal electrode 13. A barrier layer 15 and a metal electrode 16 aredeposited on this exposed metal electrode 13.

[0080] The structure of the modification shown in FIG. 4 can befabricated as explained above.

[0081] (Second Embodiment)

[0082] As the second embodiment of the present invention, a capacitorcontaining no polysilicon will be explained.

[0083]FIG. 6 is a conceptual view showing the major sectional structureof the capacitor formed in a semiconductor device of this embodiment.The same reference numerals as in FIGS. 1 to 5C denote the same elementsin FIG. 6, and a detailed description thereof will be omitted.

[0084] That is, compared to the capacitor shown in FIG. 1, thiscapacitor is characterized in that no polysilicon portions 7, 11, and 14are formed. More specifically, a trench is filled with metal electrodes,and this can further improve the conductivity. As a consequence, it ispossible to further improve the charge transfer rate and allow thesemiconductor device to operate at higher speed.

[0085] In this embodiment, as in the above first embodiment, the metalelectrodes used in regions A, B, and C can be made from the samematerial or different materials.

[0086] A method of fabricating the trench capacitor according to thisembodiment will be described below.

[0087]FIGS. 7A to 8C are sectional views showing the steps of a methodof fabricating the capacitor of the second embodiment.

[0088] First, as shown in FIG. 7A, a 5-nm thick silicon oxide film 2 anda 150-nm thick silicon nitride film 3 are deposited on a siliconsubstrate 1. A photoresist 4 is removed by photolithography from aregion where a trench is to be formed. The silicon oxide film 2 and thesilicon nitride film 3 are etched away by RIE.

[0089] Next, as shown in FIG. 7B, RIE is again used to etch the siliconsubstrate 1, forming a trench 5 about 5 μm deep from the siliconsurface, and the photoresist 4 is removed after that.

[0090] As shown in FIG. 7C, a 5-nm thick silicon nitride film 6 isformed on the inner walls of the trench 5. 10-nm thick titanium nitride8 and 500-nm thick tungsten 9 are sequentially deposited to completelyfill the trench 5.

[0091] As shown in FIG. 7D, an etch back process using CMP and RIE isperformed to etch the titanium nitride 8 and the tungsten 9 to a depthof about 0.5 μm from the substrate surface. After that, the exposedsilicon nitride film 6 is etched away, and a collar silicon oxide film10 about 100 nm thick is deposited.

[0092] As shown in FIG. 8A, this collar silicon oxide film 10 is etchedby RIE so as to remain only on the side walls of the trench. After that,10-nm thick titanium nitride 12 and 300-nm thick tungsten 13 aredeposited to completely fill the trench 5.

[0093] Next, as shown in FIG. 8B, an etch back process using CMP and RIEis performed to etch the titanium nitride 12 and the tungsten 13 to adepth of about 0.25 μm from the substrate surface. After that, theexposed collar silicon oxide film 10 is etched away, and a diffusionlayer 18 is formed by ion implantation or the like by doping an n-typeimpurity such as arsenic. In addition, titanium nitride 15 and tungsten16 are deposited in this order by about 10 nm and about 200 nm,respectively, thereby completely filling the trench 5.

[0094] Finally, as shown in FIG. 8C, an etch back process using CMP andRIE is performed to etch the titanium nitride 15 and the tungsten 16 toa depth of about 0.05 μm from the substrate surface. After that, theupper surface of the trench 5 is covered with a silicon oxide film 17,and the silicon nitride film 3 is removed. Consequently, a trenchcapacitor buried in the silicon substrate 1 is completed. As anelectrical connection terminal to this trench capacitor, the diffusionlayer 18 formed by the n-type impurity such as arsenic can be used.

[0095] (Third Embodiment)

[0096] As the third embodiment of the present invention, a semiconductordevice having memory cells capable of greatly increasing the integrationdensity will be described below.

[0097]FIG. 9 is a conceptual layout view showing the planar arrangementof the memory cells of the semiconductor device of this embodiment.

[0098]FIG. 10A is a sectional view taken along a line A-A in FIG. 9, andFIG. 10B is a sectional view taken along a line B-B in FIG. 9. Note thatin sectional views, including FIGS. 10A to 10D, of this embodiment, onlythe upper portion of a trench capacitor is shown, and a storage node atthe end is omitted. Note also that the internal electrode structure ofthe capacitor is not shown.

[0099] As shown in FIG. 9, the memory cells of this embodiment are fourmemory cells formed by four trench capacitors 30A to 30D and one bitline contact 32. Referring to FIG. 9, a cross-shaped pattern 34 havingthe bit line contact 32 as its center indicates an element region. Theoutside of this element region 34 is an element isolation region 26formed by STI (Shallow Trench Isolation).

[0100] Although the capacitors 30A to 30D can have polysiliconelectrodes, the capacitors having metal electrodes according to thefirst and second embodiments of the present invention are more desirablebecause high-speed operations are possible.

[0101] Referring to FIG. 9, gate electrodes 42A to 42D running in thelongitudinal direction are gate electrodes buried lower than thesubstrate surface of a silicon substrate 1. The gate electrode 42B is aword line of the capacitor 30D, and the gate electrode 42C is a wordline of the capacitor 30B.

[0102] Gate electrodes 44A and 44B running in the lateral direction inFIG. 9 are gate electrodes formed on the substrate surface of thesilicon substrate 1. The gate electrode 44A is a word line of thecapacitor 30A, and the gate electrode 44B is a word line of thecapacitor 30C.

[0103] The buried gate electrodes 42A to 42D are linearly formedadjacent to the cell capacitors. The gate electrodes 44A and 44B formedon the substrate surface have bent interconnection patterns, as shown inFIG. 9, in order to well increase the distance to gate cell capacitorsto be controlled, and the gate length.

[0104] The bit line contact 32 is formed in self-alignment on adiffusion layer 55 surrounded by the four gates 42B, 42C, 44A, and 44B.

[0105] In the structure shown in FIG. 10A, by adjusting the voltage tobe applied to the gate electrode 42B serving as a word line, the rangeof a depletion layer spreading in the silicon substrate 1 can becontrolled. Accordingly, an electrode 24 of the trench 30D and the bitcontact 32 can be electrically connected or disconnected.

[0106] Likewise, in the structure shown in FIG. 10B, the range of adepletion layer spreading in the silicon substrate 1 can be controlledby adjusting the voltage to be applied to the gate electrode 44B servingas a word line. This allows electrical switching between an electrode 24of the trench 30C and the bit contact 32.

[0107] In this embodiment, the buried gate electrodes 42 and the gateelectrodes 44 which are formed on the substrate surface andperpendicular to the buried gate electrodes 42 are used as word lines.Consequently, the four memory cell capacitors 30A to 30D can beconnected to one bit line contact 32. In the device shown in FIGS. 19Ato 20C, only two memory cell capacitors are connected to one bit linecontact. That is, this embodiment can increase the integration density,compared to the DRAM cell shown in FIGS. 19A to 20C, when the samedesign rule is applied.

[0108]FIG. 1C is a sectional view showing the main components of a logiccircuit portion corresponding to FIG. 10A. That is, FIG. 10C shows thesectional structure of an FET (Field Effect Transistor) of a logiccircuit portion using a buried gate. Referring to FIG. 10C, a gateelectrode 39 surrounded by a gate insulating film 38 is buried in thesubstrate 1.

[0109] Each of the buried gate electrode 42B and a buried gate electrode42X has a stacked structure of the tungsten layer 39 and a siliconnitride layer 40. Under adjacent bit line contacts 32, the diffusionlayer 55 is formed below salicide 57.

[0110] This embodiment uses these buried gate electrodes and hence hasthe effect of suppressing transistor short channels in the logicportion. A similar effect is obtained in a capacitor cell portion. Thatis, referring back to FIG. 10A, the gate electrode 42B surrounded by theinsulating layer 38 is buried between the capacitor 30D and the lowerportion of the bit line contact 32. This suppresses the short channeleffect between the capacitor and the bit line contact.

[0111]FIG. 1OD is a sectional view showing the major components of alogic circuit portion corresponding to FIG. 10B. That is, FIG. 10D showsthe sectional structure of a logic circuit portion in which a gateelectrode on the substrate surface is a word line. Similar to the trenchcell capacitor shown in FIG. 10B, salicide 57 is formed on the diffusionlayer 55 on the bit line contact side, and each of the gate electrode44B and a gate electrode 44X has a stacked structure of the tungstenlayer 39 and the silicon nitride layer 40. In this structure, an LDD(Lightly Doped Drain) region 51 is preferably formed to prevent theshort channel effect. The side walls of the gate electrode 44X arecovered with a side wall protective insulating film 53 for forming theLDD region 51.

[0112]FIG. 11 is a plan layout view showing an example of the cellstructure of a DRAM. Trench capacitors 30 serving as memory cells arearranged in a matrix manner such that their long and short edges pointin the longitudinal and lateral directions, respectively, in FIG. 11.Also, buried electrodes 42 run in the longitudinal direction of FIG. 11,and gate electrodes 44 on the substrate surface run in the lateraldirection of FIG. 11. Bit lines BL run obliquely to these two types ofgate electrodes 42 and 44 perpendicular to each other. These bit linesBL are connected to predetermined bit contacts 32.

[0113] A method of fabricating the semiconductor device of thisembodiment will be described below.

[0114]FIGS. 12A to 18B are sectional views showing the steps offabricating the memory cells and logic circuit portions of thisembodiment. Of these drawings, FIGS. 12A to 13B, 15A, 15B, 17A, and 17Billustrate the steps of the memory cell and logic circuit portion usingburied gate electrodes. FIGS. 14A, 14B, 16A, 16B, 18A, and 18B depictthe steps of the memory cell and logic circuit portion in which gateelectrodes are formed on the substrate surface.

[0115] First, as shown in FIGS. 12A and 12B, grooves for gate electrodesare formed. More specifically, a trench memory capacitor 30 and a buriedelement isolation region 26 are formed in the surface of a siliconsubstrate 1. The element isolation region 26 can be formed by, e.g., theSTI technology. Next, a protective film is deposited on the surface ofthe substrate 1 and patterned to form a mask by lithography. Grooves Gare formed in SiO₂ of the substrate 1 and the element isolation region26 by RIE. The protective film can have a stacked structure of TEOS 28and SiN 200 each about 200 nm thick. Silicon and SiO₂ in the maskopening portions are selectively etched by this RIE. The etching amountis, e.g., a depth of about 300 nm from the surface of the substrate 1.

[0116] Subsequently, as shown in FIGS. 13A and 13B, gate electrodes areformed. First, a gate insulating film 38 is formed on the inner wallsurfaces of the exposed grooves G. This gate insulating film 38 has anSiO₂/SiN deposited structure formed by depositing a silicon nitride filmafter the silicon surface is oxidized, or by nitriding a silicon oxidefilm. The thickness of the gate insulating film 38 can be about 5 nm.After that, a metal 39 serving as gate electrodes is deposited, and CMP(Chemical Mechanical Polishing) is performed to polish to the RIEprotective film 28, thereby removing the metal deposited on the surface.In addition, CDE (Chemical Dry Etching) is performed to etch back thegate insulating film 38 to a portion below the surface of the substrate1. Furthermore, an insulator 40 serving as an upper protective film ofgate electrodes is deposited. This insulator deposited on regions otherthan the grooves G is removed by CMP and CDE. The metal 39 serving asgate electrodes is, e.g., W (tungsten) about 200 nm thick. Theprotective insulating film 40 of gate electrodes can be an SiN filmabout 500 nm thick.

[0117] As shown in FIGS. 14A and 14B, the steps of forming gateelectrodes on the silicon substrate 1 is started. First, the protectivefilm 28 on the substrate surface is removed, and a gate insulating film38 is formed in prospective gate electrode regions. A metal 39 servingas gate electrodes and a protective insulating film 40 as the upperportions of gate electrodes are deposited, patterned by lithography, andprocessed by RIE, thereby forming gate electrodes 44.

[0118] As shown in FIGS. 15A and 15B, P (phosphorus) ions are implantedto form an N⁻ diffusion layer 54 in element regions of the memory celland the n-type logic circuit portion. The ion implantation condition issuch that this N⁻ diffusion layer 54 is deeper than an N⁺ diffusionlayer 55 to be formed later by ion implantation. In a memory cellstructure in which a buried gate electrode 42 functions as a word line,the N⁻ diffusion layer 54 is formed only on the bit line contact side.

[0119] As shown in FIGS. 16A and 16B, in a memory cell structure inwhich a gate electrode on the substrate surface functions as a wordline, P ions are implanted to form N⁻ diffusion layers 51 on both thebit line contact side and the trench cell capacitor side. In addition,an insulating film serving as a protective film of the gate side wallsis deposited and etched back by RIE, thereby completely protecting themetal serving as the gate electrodes with a side wall insulating film53.

[0120] Finally, as shown in FIGS. 17A to 18B, As (arsenic) ions areimplanted to form N⁺ diffusion layers 55 in the lower portions of bitline contacts 32 and in source and drain portions of the logic circuitportion. A metal is deposited on these N⁺ diffusion layers 55 andallowed to react to form salicide 56. Before that, a protective film 57made of, e.g., TEOS is deposited on the cell capacitor side of the gateelectrodes 42 and 44, so that the N⁺ diffusion layers 55 and thesalicide 56 are not formed. After that, a dielectric interlayer 60 isdeposited and planarized by CMP, forming bit line contacts 32 and sourceand drain contacts 32. Since the metal layer 39 serving as the gateelectrode is protected by the insulating film, these contacts 32 can beeasily formed. For example, the contacts 32 can be formed inself-alignment by selective etching of contact holes and selectivegrowth of W (tungsten).

[0121] That is, the gate insulating film 38 is formed on the side wallsof the metal layer 39 serving as the gate electrodes, and the bit linecontacts 32 are formed in contact with this gate insulating layer 38.Accordingly, the bit line contact 32 can be formed in self-alignment.

[0122] After that, a DRAM/logic-embedded device is completed through thenormal DRAM and logic multilayered interconnection processes.

[0123] This embodiment can raise the integration density of an embeddeddevice having both a DRAM and a logic circuit.

[0124] The embodiments of the present invention have been explained withreference to practical examples. However, the present invention is notrestricted to these practical examples.

[0125] For example, those skilled in the art can obtain similar effectsby properly changing, within the scope of the present invention, thestructures and materials of the semiconductor devices as explainedabove.

[0126] In the first and second embodiments as described above, at leasta portion of a trench capacitor electrode is formed by a metal. This canlower the electrical sheet resistance of the electrode and shorten thesignal propagation time prolonged by CR delay. As a consequence, theread/write time can be reduced.

[0127] Also, the third embodiment described above can realize areduction of the cell area, which is required in a DRAM and aDRAM/logic-embedded device. The use of a buried gate electrode structurein a cell transistor and a logic circuit portion increases the gatelength, and this can reduce the short channel effect. Since aninsulating protective film is deposited on a gate electrode, a bit linecontact can be formed in self-alignment.

What is claimed is:
 1. A semiconductor device having a trench capacitor,wherein said trench capacitor comprises: a trench formed in a surfaceportion of a semiconductor substrate; an insulating layer formed on theinner wall surfaces of said trench; and an electrode portion formedinside said trench having said insulating layer, and said electrodeportion has a metal portion.
 2. A device according to claim 1, whereinsaid electrode portion further has a polysilicon portion.
 3. A deviceaccording to claim 2, wherein said polysilicon portion is formed betweensaid metal portion and said insulating layer on the inner wall surfacesof said trench.
 4. A device according to claim 1, wherein said electrodeportion further has a metal nitride portion.
 5. A device according toclaim 4, wherein said metal nitride portion is formed between saidpolysilicon portion and said metal portion.
 6. A device according toclaim 1, wherein the interior of said trench is divided into first,second, and third regions in the order named from the bottom surfacealong a direction of depth, said insulating layer is formed on thebottom surface of said trench and on the inner wall surfaces from thebottom surface to the first and second regions of said trench, and saidelectrode portion has a structure in which in the first region, a firstpolysilicon portion is formed on the bottom surface and inner wallsurfaces on which said insulating layer is formed, a first metal nitrideportion is formed on the surface of said first polysilicon portion, anda first metal portion is buried in the surface of said first metalnitride portion, in the second region, a second polysilicon portion isformed on the inner wall surfaces on which said insulating layer isformed and on the surface of the first region, a second metal nitrideportion is formed on the surface of said second polysilicon portion, anda second metal portion is buried in the surface of said second metalnitride portion, and in the third region, a third polysilicon portion isformed on the inner wall surfaces on which said insulating layer is notformed and on the surface of the second region, a third metal nitrideportion is formed on the surface of said third polysilicon portion, athird metal portion is buried in the surface of said third metal nitrideportion, and a diffusion region is formed around said third polysiliconportion in said semiconductor substrate.
 7. A device according to claim1, wherein the interior of said trench is divided into first, second,and third regions in the order named from the bottom surface along adirection of depth, said insulating layer is formed on the bottomsurface of said trench and on the inner wall surfaces from the bottomsurface to the first and second regions of said trench, and saidelectrode portion has a structure in which in the first region, a firstpolysilicon portion is formed on the bottom surface and inner wallsurfaces on which said insulating layer is formed, a first metal nitrideportion is formed on the surface of said first polysilicon portion, anda first metal portion is buried in the surface of said first metalnitride portion, in the second region, a second polysilicon portion isformed on the inner wall surfaces on which said insulating layer isformed, a second metal nitride portion is formed on the inner wallsurfaces on which said second polysilicon portion is formed and on thesurface of the first region, and a second metal portion is buried in thesurface of said second metal nitride portion, and in the third region, athird polysilicon portion is formed on the inner wall surfaces on whichsaid insulating layer is not formed, a third metal nitride portion isformed on the inner wall surfaces on which said third polysiliconportion is formed and on the surface of the second region, a third metalportion is buried in the surface of said third metal nitride portion,and a diffusion region is formed around said third polysilicon portionin said semiconductor substrate.
 8. A device according to claim 1,wherein the interior of said trench is divided into first, second, andthird regions in the order named from the bottom surface along adirection of depth, said insulating layer is formed on the bottomsurface of said trench and on the inner wall surfaces from the bottomsurface to the first and second regions of said trench, and saidelectrode portion has a structure in which in the first region, a firstmetal nitride portion is formed on the bottom surface and inner wallsurfaces on which said insulating layer is formed, and a first metalportion is buried in the surface of said first metal nitride portion, inthe second region, a second metal nitride portion is formed on the innerwall surfaces on which said insulating layer is formed and on thesurface of the first region, and a second metal portion is buried in thesurface of said second metal nitride portion, and in the third region, athird metal nitride portion is formed on the inner wall surfaces onwhich said insulating layer is not formed and on the surface of thesecond region, a third metal portion is buried in the surface of saidthird metal nitride portion, and a diffusion region is formed aroundsaid third polysilicon portion in said semiconductor substrate.
 9. Adevice according to claim 1, wherein said metal contains, as a maincomponent thereof, a metal selected from the group consisting oftungsten (W), tantalum (Ta), nickel (Ni), molybdenum (Mo), titanium(Ti), aluminum (Al), and copper (Cu).
 10. A semiconductor device whereinfour memory capacitors are arranged into a substantially cross shapearound a bit line contact, and each of said four memory capacitors canbe connected to said bit line contact.
 11. A semiconductor devicecomprising: a bit line contact; four memory capacitors formed aroundsaid bit line contact; and four gate electrodes formed between said fourmemory capacitors and said bit line contact, wherein each of said fourmemory capacitors and said bit line contact can be connected ordisconnected by changing a voltage to be applied to a corresponding oneof said four gate electrodes.
 12. A device according to claim 11,wherein said memory capacitors are trench capacitors formed in a siliconsubstrate.
 13. A device according to claim 11, wherein at least two ofsaid four gate electrodes are formed on a predetermined surface, and theother two of said four gate electrodes are formed below thepredetermined surface.
 14. A device according to claim 13, wherein aninsulating layer is formed on the side walls of said gate electrodesformed on the predetermined surface, and said bit line contact is formedin contact with said insulating layer.
 15. A semiconductor devicecomprising: a bit line contact; a plurality of gate electrodes formedaround said bit line contact; and a plurality of memory capacitorsformed around said bit line contact, wherein each of said plurality ofmemory capacitors and said bit line contact can be connected ordisconnected by changing a voltage to be applied to a corresponding oneof said plurality of gate electrodes, and at least one of said pluralityof gate electrodes is formed on a predetermined surface, and the otherof said plurality of gate electrodes is formed below the predeterminedsurface.
 16. A device according to claim 15, wherein an insulating layeris formed on the side walls of said gate electrode formed on thepredetermined surface, and said bit line contact is formed in contactwith said insulating layer.
 17. A device according to claim 15, whereinsaid memory capacitors are trench capacitors formed in a siliconsubstrate.
 18. A device according to claim 17, wherein said trenchcapacitors are trench capacitors according to claim
 1. 19. A deviceaccording to claim 15, wherein said gate electrodes have a metalinterconnection layer.
 20. A method of fabricating a semiconductordevice in which a plurality of trench capacitors are formed around a bitline contact, and each of said plurality of trench capacitors can beconnected to or disconnected from said bit line contact, comprising thesteps of: forming said plurality of trench capacitors on a semiconductorsubstrate; forming some of a plurality of gate electrodes each forperforming switching for a corresponding one of said plurality of trenchcapacitors, such that said some gate electrodes are buried in thesurface of said substrate; forming the remaining ones of said pluralityof gate electrodes on the surface of said substrate so as to besubstantially perpendicular to said some gate electrodes; covering theside surfaces of said remaining gate electrodes with an insulatinglayer; and forming said bit line contact in contact with said insulatinglayer.